Solution-processed hafnium oxide dielectric thin films for thin-film transistors applications
Zhang, Feng, Liu, Guoxia, Liu, Ao, Shin, Byoungchul, Shan, FukaiLanguage:
english
Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2015.07.099
Date:
July, 2015
File:
PDF, 1.18 MB
english, 2015