Analysis of multilayered, nitrogen-doped aluminum oxide and...

Thin Solid Films 2015 / 09 Vol. 590

Analysis of multilayered, nitrogen-doped aluminum oxide and hafnium oxide dielectric films for wide-temperature capacitor applications

DeCerbo, J.N., Bray, K.R., Merrett, J.N.
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Volume:
590
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.07.047
Date:
September, 2015
File:
PDF, 347 KB
english, 2015
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