A Study on the Tuned Bias of Substrate in an...

Plasma Science and Technology 2001 / 06 Vol. 3; Iss. 3

A Study on the Tuned Bias of Substrate in an Inductively-Coupled Plasma Source

Zhen-feng, Ding, Xu-feng, Liu, Teng-cai, Ma
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Volume:
3
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/3/3/004
Date:
June, 2001
File:
PDF, 380 KB
english, 2001
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