Photodissociation of Tetramethylene Sulfoxide at 193 and...

Journal of Physical Chemistry 1995 / 11 Vol. 99; Iss. 48

Photodissociation of Tetramethylene Sulfoxide at 193 and 248 nm in the Gas Phase

Wu, Fei, Chen, Xirong, Weiner, Brad R.
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Volume:
99
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100048a012
Date:
November, 1995
File:
PDF, 650 KB
english, 1995
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