Copper CVD chemistry on a reactive substrate:...

Journal of Physical Chemistry 1993 / 11 Vol. 97; Iss. 44

Copper CVD chemistry on a reactive substrate: bis(hexafluoroacetylacetonato)copper and hfacH on platinum (111)

Parmeter, John E.
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Volume:
97
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100146a030
Date:
November, 1993
File:
PDF, 1.47 MB
english, 1993
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