Tuning the electrical performance of Ge nanowire MOSFETs by focused ion beam implantation
Burchhart, T, Zeiner, C, Lugstein, A, Henkel, C, Bertagnolli, EVolume:
22
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/22/3/035201
Date:
January, 2011
File:
PDF, 661 KB
english, 2011