![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - CF4/O2 plasma simulation and comparison with quartz etch experiment
Wu, Han-Ming, He, Long, Farnsworth, Jeff N., Liu, Gang, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438386
File:
PDF, 566 KB
english, 2001