Growth Temperature Dependence of µ c-Si:H Films Sputtered...

Japanese Journal of Applied Physics 1990 / 7 Vol. 29; Iss. Part 2, No

Growth Temperature Dependence of µ c-Si:H Films Sputtered with Hydrogen Gas

Sun, Yong, Tonouchi, Masayoshi, Miyasato, Tatsuro
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1029
Date:
July, 1990
File:
PDF, 593 KB
1990
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