SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Sustainability and applicability of spacer-related patterning towards 7nm node
Wallow, Thomas I., Hohle, Christoph K., Oyama, Kenichi, Yamauchi, Shohei, Hara, Arisa, Natori, Sakurako, Yamato, Masatoshi, Okabe, Noriaki, Koike, Kyohei, Yaegashi, HidetamiVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085730
File:
PDF, 1.74 MB
english, 2015