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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver, Choi, Kang-Hoon, Hanisch, Norbert, Hohle, Christoph, Steidel, Katja, Guerrero, Douglas, Figueiro, Thiago, Bartha, Johann W., Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011461
File:
PDF, 2.47 MB
english, 2013