In situ characterization of nano-scale pattern roughness...

Microelectronic Engineering 2015 / 08 Vol. 143

In situ characterization of nano-scale pattern roughness during resist dissolution process

Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro
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Volume:
143
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.03.060
Date:
August, 2015
File:
PDF, 1.11 MB
english, 2015
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