High temperature thermal stability studies of ultrathin...

Microelectronic Engineering 2015 / 11 Vol. 147

High temperature thermal stability studies of ultrathin Al2O3 layers deposited on native oxide and sulphur passivated InGaAs surfaces

Chauhan, Lalit, Gajula, Durga Rao, Mc Neill, David, Hughes, Greg
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Volume:
147
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.04.114
Date:
November, 2015
File:
PDF, 1.69 MB
english, 2015
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