Chemical vapor deposition of Si:C and Si:C:P...

Journal of Crystal Growth 2015 / 09 Vol. 426

Chemical vapor deposition of Si:C and Si:C:P films—Evaluation of material quality as a function of C content, carrier gas and doping

Dhayalan, Sathish Kumar, Loo, Roger, Hikavyy, Andriy, Rosseel, Erik, Bender, Hugo, Richard, Olivier, Vandervorst, Wilfried
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
426
Language:
english
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2015.05.019
Date:
September, 2015
File:
PDF, 3.23 MB
english, 2015
Conversion to is in progress
Conversion to is failed