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Facet engineering for SiGe/Si stressors in advanced CMOS technology
Kasim, Johnson, Reichel, Carsten, Dilliway, Gabriela, Bai, Bo, Zakowsky, NadjaVolume:
110
Language:
english
Journal:
Solid-State Electronics
DOI:
10.1016/j.sse.2015.01.010
Date:
August, 2015
File:
PDF, 974 KB
english, 2015