SiGe channel deposition by batch epitaxy
Reichel, Carsten, Schoenekess, Joerg, Dietel, Andreas, Wasyluk, Joanna, Chow, Yew Tuck, Kammler, ThorstenVolume:
110
Language:
english
Journal:
Solid-State Electronics
DOI:
10.1016/j.sse.2015.01.018
Date:
August, 2015
File:
PDF, 1.59 MB
english, 2015