Structural and electrical properties of Nb/NbNx gates on...

Thin Solid Films 2015 / 08 Vol. 588

Structural and electrical properties of Nb/NbNx gates on HfO2 gate dielectrics

Lin, Shin-Yu, Lai, Yi-Sheng
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Volume:
588
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.04.062
Date:
August, 2015
File:
PDF, 1.20 MB
english, 2015
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