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Advanced inductively coupled plasma etching processes for fabrication of resonator-quantum well infrared photodetector
Sun, J., Choi, K.K., Jhabvala, M.D., Jhabvala, C.A., Waczynski, A., Olver, K.Volume:
70
Language:
english
Journal:
Infrared Physics & Technology
DOI:
10.1016/j.infrared.2014.09.022
Date:
May, 2015
File:
PDF, 2.17 MB
english, 2015