Local distribution of residual stress of Cu in LSI...

Materials Letters 2014 / 12 Vol. 136

Local distribution of residual stress of Cu in LSI interconnect

Sato, Hisashi, Shishido, Nobuyuki, Kamiya, Shoji, Koiwa, Kozo, Omiya, Masaki, Nishida, Masahiro, Suzuki, Takashi, Nakamura, Tomoji, Nokuo, Takeshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
136
Language:
english
Journal:
Materials Letters
DOI:
10.1016/j.matlet.2014.08.088
Date:
December, 2014
File:
PDF, 1.69 MB
english, 2014
Conversion to is in progress
Conversion to is failed