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[AIP CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY: 2003 International Conference on Characterization and Metrology for ULSI Technology - Austin, Texas (USA) (24-28 March 2003)] AIP Conference Proceedings - Thickness Evaluation for 2nm SiO2 Films, a Comparison of Ellipsometric, Capacitance-Voltage and HRTEM Measurements
Ehrstein, JamesVolume:
683
Year:
2003
DOI:
10.1063/1.1622491
File:
PDF, 693 KB
2003