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Measurement of the electron attachment rates for SF[sub 6] and C[sub 7]F[sub 14] at T[sub e]=0.2 eV in a magnetized Q machine plasma
Merlino, Robert L., Kim, Su-HyunVolume:
129
Year:
2008
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.3039078
File:
PDF, 334 KB
english, 2008