[AIP FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2009 - Albany (New York) (11–15 May 2009)] AIP Conference Proceedings - Interference Microscopy For Semiconductor Back End Patterning Metrology
de Lega, Xavier Colonna, Fay, Martin, Kruse, Ryan, Grigg, David, Darwin, Michael, Knowles, Matthew, Barnak, John, Wu, Maruko, Secula, Erik M., Seiler, David G., Khosla, Rajinder P., Herr, Dan, MichaelYear:
2009
Language:
english
DOI:
10.1063/1.3251251
File:
PDF, 2.97 MB
english, 2009