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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Process Performance of Optima XEx Single Wafer High Energy Implanter
Kim, J. H., Yoon, Jongyoon, Kondratenko, S., David, J., Rubin, L. M., Jang, I. S., Cha, J. C., Joo, Y. H., Lee, A. B., Jin, S. W., Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
DOI:
10.1063/1.3548424
File:
PDF, 1.44 MB
english, 2011