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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Improvement of Poly Profile in Sub 30 nm Device By Damage Engineering and Tilted Implantation Method
Ham, Chul-Young, Kwak, Noh-Yeal, Lee, Sang-Soo, Shin, Seung-Woo, Ko, Min-Sung, Kim, Jae-Mun, Lee, Byung-Seok, Kim, Jin-Woong, Oh, Choong-Young, Kim, Yong-Su, Colombeau, Benjamin, Matsuo, Jiro, Kase, MYear:
2011
Language:
english
DOI:
10.1063/1.3548439
File:
PDF, 1.62 MB
english, 2011