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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Ion Source of Pure Single Charged Boron Based on Planar Magnetron Discharge in Self-Sputtering Mode
Vizir, A. V., Gushenets, V. I., Hershcovitch, A., Kulevoy, T. V., Oks, E. M., Yushkov, G. Yu., Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
DOI:
10.1063/1.3548454
File:
PDF, 224 KB
english, 2011