AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - A Study of Flash Anneal in combination with the conventional RTA for DRAM application
Lee, YoungHo, Lee, JinKu, Lee, MiRi, Jeon, SeungJoon, Oh, JaeGeun, Lee, Yu. Jun, Shin, MinJung, Kim, JaeYoung, Cha, SeonYong, Hong, Kwon, Park, SungKi, Kusuda, Tatsufumi, Nishihara, Hideo, Yokouchi, KYear:
2011
Language:
english
DOI:
10.1063/1.3548469
File:
PDF, 893 KB
english, 2011