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Coalescence-controlled and coalescence-free growth regimes during deposition of pulsed metal vapor fluxes on insulating surfaces
Lü, B., Münger, E. P., Sarakinos, K.Volume:
117
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4916983
Date:
April, 2015
File:
PDF, 1.52 MB
english, 2015