SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Simulation of the 45-nm half-pitch node with 193-nm immersion lithography
Biswas, Abani M., Frauenglass, Andrew, Brueck, Steven R. J., Smith, Bruce W.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536787
File:
PDF, 865 KB
english, 2004