Damage to the Silicon Substrate by Reactive Ion Etching Detected by a Slow Positron Beam
Wei, Long, Tabuki, Yasushi, Tanigawa, ShoichiroVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.7
Date:
January, 1993
File:
PDF, 1007 KB
1993