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Cu/CaF2/Diamond Metal-Insulator-Semiconductor Field-Effect Transistor Utilizing Self-Aligned Gate Fabrication Process
Umezawa, Hitoshi, Taniuchi, Hirotada, Arima, Takuya, Tachiki, Minoru, Tsugawa, Kazuo, Yamanaka, Sadanori, Takeuchi, Daisuke, Okushi, Hideyo, Kawarada, HiroshiVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.l908
Date:
September, 2000
File:
PDF, 138 KB
english, 2000