Dimensionally controlled complex 3D sub-micron pattern...

Microelectronic Engineering 2015 / 08 Vol. 143

Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)

Hafeez, Hassan, Ryu, Heon-Yul, An, Il Sin, Oh, Hye-Keun, Ahn, Jin-Ho, Park, Jin-Goo
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Volume:
143
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.02.053
Date:
August, 2015
File:
PDF, 1.86 MB
english, 2015
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