Reactive ion etching of InAlAs and InAlGaAs with...

Electronics Letters 2000 Vol. 36; Iss. 6

Reactive ion etching of InAlAs and InAlGaAs with BCl3/Cl2/CH4/H2 mixtures for long-wavelength VCSELs

Shin, J.-H., Yoo, B.-S., Kwon, O.-K.
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Volume:
36
Year:
2000
Language:
english
Journal:
Electronics Letters
DOI:
10.1049/el:20000400
File:
PDF, 529 KB
english, 2000
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