IR laser photosensitized decomposition of...

IR laser photosensitized decomposition of trimethyl(2-propynyloxy)silane for chemical vapour deposition of polydimethylsiloxane phases

Markéta Urbanová, Hiroshi Morita, Vladislav Dřı́nek, Zdeněk Bastl, Jan Šubrt, Josef Pola
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Volume:
44
Year:
1998
Language:
english
Pages:
8
DOI:
10.1016/s0165-2370(97)00082-x
File:
PDF, 306 KB
english, 1998
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