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Electrical, structural, and chemical properties of HfO[sub 2] films formed by electron beam evaporation
K. Cherkaoui, S. Monaghan, M. A. Negara, M. Modreanu, P. K. Hurley, D. O’connell, S. Mcdonnell, G. Hughes, S. Wright, R. C. Barklie, P. Bailey, T. C. Q. NoakesYear:
2008
Language:
english
DOI:
10.1063/1.2978209
File:
PDF, 1.15 MB
english, 2008