Mechanistic benefits of millisecond annealing for diffusion...

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Mechanistic benefits of millisecond annealing for diffusion and activation of boron in silicon

C. T. M. Kwok, R. D. Braatz, S. Paul, W. Lerch, E. G. Seebauer
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Year:
2009
Language:
english
DOI:
10.1063/1.3079524
File:
PDF, 1.05 MB
english, 2009
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