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Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process
V. K. Kamineni, M. Raymond, E. J. Bersch, B. B. Doris, A. C. DieboldYear:
2010
Language:
english
DOI:
10.1063/1.3380665
File:
PDF, 1.19 MB
english, 2010