AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - A Deep Level Transient Spectroscopy Study on Recrystallization of Ultra-Shallow Implanted Silicon
Okutani, Masashi, Takashima, Shuhei, Yoshimoto, Masahiro, Yoo, Woo Sik, Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
DOI:
10.1063/1.3548349
File:
PDF, 619 KB
english, 2011