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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010 - Kyoto, (Japan) (6–11 June 2010)] - Dose Control System in the Optima XE Single Wafer High Energy Ion Implanter
Satoh, Shu, Yoon, Jongyoon, David, Jonathan, Matsuo, Jiro, Kase, Masataka, Aoki, Takaaki, Seki, ToshioYear:
2011
Language:
english
DOI:
10.1063/1.3548427
File:
PDF, 379 KB
english, 2011