AIP Conference Proceedings [AIP FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2011 - Grenoble (France) (23–26 May 2011)] - Advanced Monitoring of Trace Metals Applied to Contamination Reduction of Silicon Device Processing
Maillot, P., Martin, C., Planchais, A., Seiler, David G., Diebold, Alain C., McDonald, Robert, Chabli, Amal, Secula, Erik M.Year:
2011
Language:
english
DOI:
10.1063/1.3657896
File:
PDF, 348 KB
english, 2011