Etching mechanism of niobium in coaxial Ar/Cl2 radio...

Journal of Applied Physics 2015 / 03 Vol. 117; Iss. 11

Etching mechanism of niobium in coaxial Ar/Cl2 radio frequency plasma

Upadhyay, J., Im, Do, Popović, S., Valente-Feliciano, A.-M., Phillips, L., Vušković, L.
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Volume:
117
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4914298
Date:
March, 2015
File:
PDF, 1.83 MB
english, 2015
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