Comparison of the degradation characteristics of...

Journal of Applied Physics 2015 / 03 Vol. 117; Iss. 10

Comparison of the degradation characteristics of AlON/InGaAs and Al2O3/InGaAs stacks

Palumbo, F., Krylov, I., Eizenberg, M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
117
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4914492
Date:
March, 2015
File:
PDF, 1.86 MB
english, 2015
Conversion to is in progress
Conversion to is failed