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[IEEE 32nd European Solid-State Device Research Conference - Firenze, Italy (2002.9.24-2002.9.26)] 32nd European Solid-State Device Research Conference - Influence of Doping Profile and Halo Implantation on the Threshold Voltage Mismatch of a 0.13um CMOS Technology
Croon, J.A., Augendre, E., Decoutere, S., Sansen, W., Maes, H.E.Year:
2002
Language:
english
DOI:
10.1109/essderc.2002.194997
File:
PDF, 157 KB
english, 2002