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[IEEE 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2015.6.4-2015.6.5)] 2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Simulation study of NO2-exposed H-terminated diamond FETs with Al2O3 insulator gate
Oishi, Toshiyuki, Higashi, Ryutaro, Harada, Kazuya, Koga, Yuta, Kasu, Makoto, Hirama, KazuyukiYear:
2015
Language:
english
DOI:
10.1109/imfedk.2015.7158536
File:
PDF, 307 KB
english, 2015