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[IEEE Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Osaka, Japan (2004.10.26-2004.10.29)] Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - In-situ resist temperature monitor during hot embossing lithography by fluorescence probe technique
Fu-Hsiang Ko,, Hsin-Yen Hwang,, Mei-fen Chen,, Li-Yu Weng,, Chu-Jung Ko,, Hsuen-Li Chen,Year:
2004
Language:
english
DOI:
10.1109/imnc.2004.245761
File:
PDF, 218 KB
english, 2004