Integration of chemical vapor deposition Al interconnects...

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Integration of chemical vapor deposition Al interconnects in a benzocyclobutene low dielectric constant polymer matrix: A feasibility study

H. Wickland, R. Talevi, Z. Bian, G. Nuesca, S. Sankaran, K. Kumar, R. E. Geer, A. E. Kaloyeros, J. Liu, J. Hummel, E. O. Shaffer, S. J. Martin
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Year:
2000
Language:
english
DOI:
10.1116/1.1308599
File:
PDF, 1.20 MB
english, 2000
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