![](/img/cover-not-exists.png)
Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching
M. A. Blauw, T. Zijlstra, R. A. Bakker, E. Van Der DriftYear:
2000
Language:
english
DOI:
10.1116/1.1313578
File:
PDF, 1.40 MB
english, 2000