Kinetics and crystal orientation dependence in high aspect...

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Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching

M. A. Blauw, T. Zijlstra, R. A. Bakker, E. Van Der Drift
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Year:
2000
Language:
english
DOI:
10.1116/1.1313578
File:
PDF, 1.40 MB
english, 2000
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