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Oxide nanodots and ultrathin layers fabricated on silicon using nonfocused multicharged ion beams
G. Borsoni, M. Gros-jean, M. L. Korwin-pawlowski, R. Laffitte, V. Le Roux, L. VallierYear:
2000
Language:
english
DOI:
10.1116/1.1324647
File:
PDF, 670 KB
english, 2000