Combined silicon, beryllium, and carbon tetrabromide...

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Combined silicon, beryllium, and carbon tetrabromide single-port dopant source for molecular-beam epitaxy

N. T. Moshegov, C. D. Nordquist, W. Z. Cai, T. S. Mayer, D. I. Lubyshev, D. L. Miller
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Year:
2001
Language:
english
DOI:
10.1116/1.1378008
File:
PDF, 554 KB
english, 2001
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