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Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography
V. Bellas, E. Tegou, I. Raptis, E. Gogolides, P. Argitis, H. Iatrou, N. Hadjichristidis, E. Sarantopoulou, A. C. CefalasYear:
2002
Language:
english
DOI:
10.1116/1.1526358
File:
PDF, 738 KB
english, 2002