Impact of chemistry on profile control of resist masked...

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Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas

X. Detter, R. Palla, I. Thomas-boutherin, E. Pargon, G. Cunge, O. Joubert, L. Vallier
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Year:
2003
Language:
english
DOI:
10.1116/1.1612932
File:
PDF, 718 KB
english, 2003
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