Development of void-free focused ion beam-assisted metal deposition process for subhalf-micrometer high aspect ratio vias
V. Ray, N. Antoniou, N. Bassom, A. Krechmer, A. SaxonisYear:
2003
Language:
english
DOI:
10.1116/1.1621666
File:
PDF, 1.07 MB
english, 2003